Microneedle array device and its fabrication method

ABSTRACT

A microneedle array device and its fabrication method are provided. The microneedle array device comprises a supporting pad and plural of microneedles. Each microneedle has a top portion with a via thereon, thereby the microfluid may flow in or out. The intersection between the top portion and the inner tube of a microneedle forms a convex needle structure, and is almost perpendicular to the upper surface. For each microneedle, a hollow closed tube is formed between the top portion and the supporting pad. The fabrication method uses the substrates with high transmittance and plural of convex area thereon as the upper and lower caps, and applies a photolithography process to fabricate a microneedle array mold. It then sputters or electroplates metal material on the mold. The microneedle array is formed after having taken off the mold. It is a simple fabrication process.

FIELD OF THE INVENTION

The present invention generally relates to a microneedle arraystructure, and more specifically to a microneedle array device, and amethod of forming the same.

BACKGROUND OF THE INVENTION

The current microneedle array may be made of silicon (Si substrate),metal or polymer. The manufacturing methods of Si substrate microneedlearray can further be categorized as using wet etching or dry etching.The manufacturing process of metal microneedle array can further becategorized as using electroplating or deposition. The manufacturingprocess of polymer microneedle array can be further categorized as usingmolding or photolithography.

Among the methods of microneedle array, the most widely adopted is usingSi substrate to fabricate the hollow needles or mold. However, thefabrication process of using Si substrate is more complicated, asdisclosed in WO0217985, and requires many steps of wet/dry etching andthin film deposition. As it takes a longer time to fabricate, the yieldrate is low and the cost is high. U.S. Pat. No. 6,334,856 disclosed amethod of fabricating a microneedle array having flat needle tips andtapered tube, as shown in FIG. 1. This type of design limits the widthof the flow channel and the flexibility of the needle. To fabricate theneedle higher than 100 um, the needle density must be restricted incompromise for an appropriate size of aperture and strength of needlestructure. The restriction of low needle density further causes theproblem of insufficient sampling. In addition, the Si substratemicroneedles are brittle and break easily.

The tip of the hollow microneedle in most prior arts is designed asflat, except the design disclosed in WO0217985 (see FIG. 2), which is aslant. This is because a slant tip is easier to penetrate the human skinfor micro-sampling than the flat tip, as the human skin is flexible.

Kim et al. disclosed a method for fabricating metal microneedle array inJournal of Micromechanics and Micro engineering in 2004. They spread twolayers of SU-8 on a glass substrate and used a back exposure toseparately bake the two layers of SU-8. They also used reactive ionetching to obtain an SU-8 pillar array structure, and then usedsputtering, electroplating, planarization and polishing to fabricate atapered metal hollow microneedle array, as shown in FIG. 3. However, themethod requires multiple layers of SU-8 to achieve the layered effectand the high aspect ratio of the pillar is prone to slant or twist. Thefabrication process is difficult to maintain the quality.

U.S. Pat. No. 6,663,820 disclosed another method of using lithographyand photolithography to fabricate polymer microneedle array, as shown inFIG. 4. This method has the advantages of rapid fabrication of micromoldand microneedle, and low fabrication cost of the material and process.However, the flat-tip microneedles are still limited in the application.In addition, the polymer microneedles of this method do not havemicrochannels or reservoirs, and require additional fabrication processto attach the microchannels and reservoirs, if necessary. It is,therefore, difficult to have this method applied for mass production.

Numerous methods of fabricating microneedle array have been proposed.Regardless of the material used, the object of the microneedle arrayincludes the capability to penetrate the human skin for micro-injectionor micro-sampling painlessly, easy to fabricate, low in fabrication costand safe to use.

SUMMARY OF THE INVENTION

The present invention has been made to overcome the aforementioneddrawback of conventional bonding methods of fabricating microneedlearray. The primary object of the present invention is to provide amicroneedle array device, including a supporting pad and a plurality ofmicroneedles. The supporting pad has an upper surface. Each microneedlehas a slant or concave top portion with a via thereon, thereby themicrofluid may flow in or out. The intersection between the top portionand the inner tube of a microneedle forms a convex needle structure.Each microneedle stands on the upper surface of the supporting pad andis almost perpendicular to the upper surface. A hollow closed tube isformed between the top portion and the supporting pad.

The supporting pad further includes a bottom portion and at least alayer of reservoir. The reservoir is located above the bottom portionand below the microneedle. The reservoir can be further divided, ifnecessary, into a plurality of reservoir units, with reservoir unitsseparated from one another to prevent the microfluid flowing from oneunit to another. The monolithic metal structure of the present inventionincludes convex needle structure formed by the intersection of the slantor concave top portion of each microneedle and the inner tube of amicroneedle. The main feature of the present invention includes thesafety of use and the improvement of pain. Furthermore, the rigidity andthe slant uniformity of the microneedle with slant top portion are bothimproved so that it is suitable for molding and mass production.

Another object of the present invention is to provide a method offabricating a microneedle array device, including the steps of: (1)providing a substrate, and forming a plurality of concave areas on asurface of the substrate; (2) spreading a layer of photo-sensitivematerial on the substrate and covering a layer of light transmissionmaterial on top of the photo-sensitive material; (3) using a patternedmask for exposing and lithography of the light transmission material toobtain a polymer hollow microneedle array mold based on the lighttransmission material; and (4) using the polymer hollow microneedlearray mold to form a microneedle array device.

According to the present invention, there are several techniques to beused in step (1) of forming a plurality of concave areas, includingetching, X-ray photo-etching, ultra-violet etching, ion beam etching andexcimer laser micromachining. Step (4) of the method further includesthe following substeps: (4a) coating a layer of metal on the outersurface of the polymer hollow microneedle array mold and the lighttransmission material to form a microneedle array; and (4b) removing thepolymer hollow microneedle array mold from the microneedle array. Instep (4), the techniques for coating metal to the surface of the polymerhollow microneedle array mold include electroplating, electrolessplating, evaporation, and sputtering. The metal used can be Cu, Cr, Ni,Fe, Au, Pt, Pd, stainless steel and their alloys. The present inventionuses the coating of photo-sensitive polymer on the concave areas of thesubstrate and covering with a light transmission material, which isexposed to define an outline of the microneedle and using lithography toobtain a polymer hollow microneedle array mold using the high lighttransmission material as the base for further fabrication of a metalmicroneedle array. The advantages of the fabrication method of thepresent invention are simple process and low in cost.

The foregoing and other objects, features, aspects and advantages of thepresent invention will become better understood from a careful readingof a detailed description provided herein below with appropriatereference to the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 shows a conventional flat-top microneedle array made of Sisubstrate.

FIG. 2 shows a conventional slant top microneedle array made of Sisubstrate.

FIG. 3 shows a conventional flat-top microneedle array made of metal.

FIG. 4 shows a conventional flat-top microneedle array made of polymer.

FIG. 5A shows a cross-sectional view of the first embodiment of amicroneedle array device of the present invention.

FIG. 5B shows a schematic view of the concave top of a microneedle ofthe present invention.

FIG. 5C shows a schematic view of the first embodiment of a microneedlearray device of the present invention.

FIGS. 6A and 6B show respective top views of the microneedles havingdifferent inner tube shapes.

FIGS. 7A-7J show the fabrication method of the first embodiment of amicroneedle array device of the present invention.

FIGS. 8A and 8B show respective top cross-sectional views of thedifferent shapes of concave areas of Si substrate of the presentinvention.

FIG. 9A shows a cross-sectional view of the second embodiment of amicroneedle array device of the present invention.

FIG. 9B shows a schematic view of the second embodiment of a microneedlearray device of the present invention.

FIG. 9C shows a top view of FIG. 9B.

FIG. 10A shows a cross-sectional view of the third embodiment of amicroneedle array device of the present invention.

FIG. 10B shows a schematic view of the third embodiment of a microneedlearray device of the present invention.

FIG. 10C shows a top view of FIG. 10B.

FIGS. 11A-11K show the fabrication method of the second embodiment ofthe present invention.

FIGS. 12A-12L show the fabrication method of the third embodiment of thepresent invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIG. 5A shows a cross-sectional view of a microneedle array device 50 ofthe present invention. As shown in FIG. 5A, microneedle array device 50includes a supporting pad 51 and a plurality of microneedles 52.Supporting pad 51 includes an upper surface 511. For the purpose ofsafety and effective skin penetration, the top portion of eachmicroneedle 52 includes a convex needle structure 521. The top portionof microneedle 52 can be a slant 523 or a concave surface 523 a, asshown in FIG. 5B. The top portion of microneedle 52 intersects with tubewall 524 to form convex needle structure 521. In addition, top portion523 or 523 a includes a via 522, which allows the follow of amicrofluid, for example, a medicine to flow out or a blood to flow in.According to the present invention, the microneedle array is amonolithic metal structure with each microneedle 52 standing on andperpendicular to the upper surface 511 of supporting pad 51, and ahollow closed tube being formed between top portion 523 (523 a) andsupporting pad 51.

FIG. 5C shows a schematic view of the structure of microneedle arraydevice 50 of the present invention. The top portion 523 of eachmicroneedle 52 is a slant, and the cross-section of tube wall 524 formsa closed oval, circular, or triangular shape, as shown in FIG. 6A andFIG. 6B, respectively. The metal for fabricating microneedle array canbe Cu, Cr, Ni, Fe, Au, Pt, Pd, stainless steel, or their alloys. Therange of the aperture of each microneedle is 10-70 um, the outercircumference is 80-250 um, and the height is 100-600 um.

FIGS. 7A-7J shows the fabrication method of the first embodiment of thepresent invention. First, a substrate is provided, which including aplurality of concave areas on the surface. According to the presentinvention, there are several techniques for forming a plurality ofconcave areas, including etching, X-ray photo-etching, ultra-violetetching, ion beam etching and excimer laser micromaching. The presentembodiment uses an anisotropic wet etching for explanation.

As shown in FIG. 7A, a single crystal silicon with a grainorientation[1,0,0] is used as a substrate 700, and a protective layer 702 isdeposited on the surface. Protective layer 702 can be made of Si₃N₄. Thewet etching areas 705 are defined, as shown in FIG. 7B, followed by wetetching. The solution commonly used in silicon anisotropic wet etchingincludes potassium hydroxide (KOH) and Tetra-methyl-ammonium hydroxide(TMAH). After etching the silicon, a plurality of concave areas 710 areformed. Each concave area 710 has two slants 711, as shown in FIG. 7C.Slant 711 defines a slant top 523 of each microneedle. The shape of theplurality of concave areas can vary in accordance with the fabricationprocess, for example, a V-shape 710 a or U-shape 710 b, as shown in FIG.8A and FIG. 8B, respectively. In other words, a U-shaped concave area710 defines a concave curvy top portion 523 a of a microneedle.

Before the coating of photo-sensitive material 720, a sacrificial layeror mold release layer 715 is coated on top of substrate 700 for thesubsequent mold release, as shown in FIG. 7D. The commonly used materialfor the sacrificial or mold release layer includes Su-8, Al, Au, siliconrubber and Teflon.

The next step is to spread a photo-sensitive material 720 on top ofsacrificial layer 715, and a light transmission material 730 on top ofphoto-sensitive material layer 720, as shown in FIG. 7E. Photo-sensitivematerial 720 used in the present invention is SU-8, a negativephoto-resist developed by Microlithography Chemical Corporation (USA),or JSR 430N, a positive or negative photo-resist developed by JapaneseSynthetic Rubber (Japan). Light transmission material can be eitherglass or PMMA.

The next step is exposure and lithography to obtain a polymer hollowmicroneedle array mold 760 using light transmission material 730 as abase. As shown in FIG. 7F, a patterned mask 750 defining the shape oftube wall 524 and via 522 of microneedle 52 is used before the exposure.The shapes can be either oval, circular 524 a, or triangular 524 b, asshown in FIG. 5C, FIG. 6A, and FIG. 6B, respectively. If SU-8 negativephoto-resist is used as photo-sensitive material 720, the bond forms ata later stage of the exposure to light and stays during the development.The un-exposed part is dissolved. After the mold release, a polymerhollow microneedle array mold 760 having a plurality of polymermicroneedles is obtained for subsequent metal plating, as shown in FIG.7G. Because the present invention directly applies photo-sensitivematerial 720 on the slant of concave areas 710 on substrate or theconcave curvy top, the top portion 761 of polymer microneedle 765 isalso slant or concave curvy surface. Microneedle 765 has a via 762reaching light transmission material 730.

Finally, polymer hollow microneedle array mold 760 is used to form amicroneedle array device 50, as shown in FIG. 7J. The forming of amicroneedle array device step further includes the following twosubsteps: (a) coating a metal layer 780 on the outer surfaces of polymerhollow microneedle array mold 760 and light transmission material layer730 to form a microneedle array device 50, and (b) removing polymerhollow microneedle molde 760 from microneedle array device 50.

Similarly, before the coating of metal layer 780 in sub-step (a), asacrifical layer or mold release layer 770 is deposited on the outersurfaces of polymer hollow microneedle array mold 760 and lighttransmission material layer 730, and a starting layer 771 (FIG. 7H) iselectroplated to electro-cast. The material for sacrificial layer 770includes either Cu, Al, or Au. The material for starting layer 771 isany metal.

In sub-step (a), the electroplating, electroless plating, evaporationand sputtering is used to plate metal layer 780 on the upper surface(FIG. 7I) of strating layer 771. The metal for plating metal layer 780may include Cu, Cr, Ni, Fe, Au, Pt, Pd, stainless steel, and theiralloys.

In sub-step (b), the technique for removing polymer hollow microneedlearray mold 760 from microneedle array device 50 is to remove sacrificiallayer 770 deposited on the outer surfaces of polymer hollow microneedlearray mold 760 and light transmission material layer 730. The techniqueincludes oxygen plasma removal, thermal removal, solvent removal,aqueous removal or photo-degradation removal.

FIG. 9A and FIG. 10A show the second and the third embodiments of amicroneedle array device of the present invention, respectively.

FIG. 9A is similar to the structure shown in FIG. 5A. The differencelies in microneedle array device 90 in FIG. 9A has a reservoir layer 91below a plurality of microneedles 52 and above bottom portion 92.Reservoir layer 91 is for storing or mixing the medicine or collectingblood sample. As shown in FIG. 9B and FIG. 9C, reservoir 91 may befurther divided into a plurality of reservoir unit 93. Reservoir units93 are separate from one another to block the flow of microfluid. Theymay be used for blood analysis.

Similarly, microneedle array device 100 in FIG. 10A has two reservoirlayers 101 below a plurality of microneedles 52 and above bottom portion102. Reservoir layer 91 is for storing or mixing the medicine orcollecting blood sample. As shown in FIG. 10B and FIG. 10C, reservoirlayers 101 may be further divided into a plurality of reservoir unit103. Reservoir units 103 are separate from one another to block the flowof microfluid.

FIGS. 11A-11K show the fabrication method of the second embodiment ofthe present invention.

The fabrication method of the second embodiment is similar to that offirst embodiment. The only difference is in the exposure and developmentstep. Because the second embodiment has a reservoir layer 91 in thestructure, the second embodiment requires an additional exposure thanthe first embodiment. During the second exposure, a correspondingpatterned mask 750 a is used to define reservoir layer 91 and the shapeof reservoir units 93 within. By adjusting the exposure dosage tocontrol the depth “a” of the reservoir layer, the result of this step isto obtain a polymer hollow microneedle array mold 160. The remainingsteps of the fabrication are identical to those in FIG. 7A-7J.

FIGS. 12A-12L show the fabrication method of the third embodiment of thepresent invention.

The fabrication method of the third embodiment is also similar to thatof first embodiment The only difference is still in the exposure anddevelopment step. Similarly, because the third embodiment has two morereservoir layers 101 in the structure, the third embodiment requires twoadditional exposures than the first embodiment. During the second andthird exposures, a corresponding patterned mask 750 a, 750 b is used todefine, respectively, each reservoir layer 101 and the shape ofreservoir units 103 within. By adjusting the exposure dosage to controlthe depths “a” and “b” of the reservoir layers, the result of this stepis to obtain a polymer hollow microneedle array mold 260. Therefore,according to the present invention, the first exposure is to form theshape and the structure of the microneedles, and the second andsubsequent exposures are for forming the shape and the structure of thereservoir layer. The remaining steps of the fabrication are identical tothose in FIG. 7A-7J.

In summary, compared to the other molding techniques, the presentinvention directly applies photo-sensitive polymer on the concave areasof the substrate to form a polymer hollow microneedle array mold havingslants and concave curvy surface. Then, the polymer hollow microneedlearray mold is used with the evaporation and electroplating techniques tofabricate metal microneedle array device. This method greatly reducesthe complexity of the fabrication and the cost of the material. Themetal microneedle array electroplated on the polymer hollow microneedlearray mold has a good rigidity and slant uniformity, and is suitable formass production. The present invention may be widely used in bloodsampling, micro-sampling and medication injection systems.

Although the present invention has been described with reference to thepreferred embodiments, it will be understood that the invention is notlimited to the details described thereof. Various substitutions andmodifications have been suggested in the foregoing description, andothers will occur to those of ordinary skill in the art. Therefore, allsuch substitutions and modifications are intended to be embraced withinthe scope of the invention as defined in the appended claims.

1. A microneedle array device having a monolithic structure, comprising:a supporting pad having an upper surface; and a plurality ofmicroneedles, each microneedle having a slant or concave curvy topportion, said top portion having a via for microfluid to flow, a hollowclosed tube being formed between said top portion to said supportingpad, said top portion intersecting with wall of said tube wall to form aconvex needle structure, each microneedle standing on said upper surfaceof said supporting pad, and said microneedle being perpendicular to saidupper surface of said supporting pad.
 2. The device as claimed in claim1, wherein said tube wall of each microneedle toruses to form an oval,circular or triangular shape.
 3. The device as claimed in claim 1,wherein said supporting pad further comprises a bottom portion and atleast a reservoir layer, said reservoir layer is located above saidbottom portion and below said plurality of microneedles.
 4. The deviceas claimed in claim 3, wherein said at least reservoir layer is furtherdivided into a plurality of reservoir units, said reservoir units areseparate from one another to prevent microfluid stored in said reservoirunits from flowing among said reservoir units.
 5. The device as claimedin claim 1, wherein said metal structure is made of a metal selectedfrom one of the Cu, Cr, Ni, Fe, Au, Pt, Pd, stainless steel, and theiralloy.
 6. The device as claimed in claim 1, wherein the aperture of saidmicroneedle ranges from 10 um to 60 um.
 7. The device as claimed inclaim 1, wherein the circumference of said microneedle ranges from 70 umto 250 um.
 8. The device as claimed in claim 1, wherein the height ofsaid microneedle ranges from 100 um to 600 um.
 9. A method offabricating a microneedle array device, comprises the steps of: (1)providing a substrate, and forming a plurality of concave areas on asurface of said substrate; (2) coating a layer of photo-sensitivematerial on top of said substrate, and coating a layer of lighttransmission material on top of said photo-sensitive material; (3) usinga patterned mask for exposure and development on said light transmissionmaterial to obtain a polymer hollow microneedle array mold using saidlight transmission material as a base; and (4) forming a microneedlearray device using said polymer hollow microneedle array mold.
 10. Themethod as claimed in claim 9, wherein said substrate in step (1) is madeof silicon.
 11. The method as claimed in claim 9, wherein said pluralityof concave areas on said substrate in step (1) are formed by an etchingtechnique.
 12. The method as claimed in claim 11, wherein said etchingtechnique is anisotropic wet etching technique.
 13. The method asclaimed in claim 9, wherein said plurality of concave areas on saidsubstrate in step (1) are formed by X-ray etching, ultra-violet etching,ion beam etching, or excimer laser micromachining.
 14. The method asclaimed in claim 9, wherein said plurality of concave areas on saidsubstrate in step (1) are formed by micro electro discharge machiningtechnique.
 15. The method as claimed in claim 9, wherein saidphoto-sensitive material in said step (2) is SU-8 or JSR430N.
 16. Themethod as claimed in claim 9, wherein said light transmission materialin said step (2) is PMMA or glass.
 17. The method as claimed in claim 9,wherein said step (3) further comprises a step of using a patterned maskto define the shape of microneedles.
 18. The method as claimed in claim17, wherein patterned mask comprises a plurality of pairs of closedcurves, each said pair of closed curves comprise a first closed curveand a second closed curve, said first closed curve encompasses saidsecond closed curve, said second closed curve has a circumferencesmaller than that of said first closed curve, and remaining areas aremasked except the area between said first and said second closed curves.19. The method as claimed in claim 17, wherein said step (3) furthercomprises a step of forming at least a reservoir layer.
 20. The methodas claimed in claim 19, wherein the shape of each said reservoir layeris defined by using a corresponding patterned mask.
 21. The method asclaimed in claim 19, wherein the depth of each said reservoir layer iscontrolled by adjusting exposure dosage of light.
 22. The method asclaimed in claim 9, wherein said step (4) further comprises thefollowing sub-steps of: (4a) coating a metal layer on outer surfaces ofsaid polymer hollow microneedle array mold and said light transmissionmaterial to form said microneedle array device; and (4b) removing saidpolymer hollow microneedle array mold from said microneedle arraydevice.
 23. The method as claimed in claim 22, wherein said coating ofmetal or other material in said step (4a) is by electroplating,electroless plating, evaporation, or sputtering.
 24. The method asclaimed in claim 22, wherein said metal is chosen from one of the Cu,Cr, Ni, Fe, Au, Pt, Pd, stainless steel and their alloys.
 25. The methodas claimed in claim 22, wherein said removing said polymer hollowmicroneedle array mold in said step (4b) uses one of oxygen removal,thermal removal, solvent removal, aqueous removal, photo-degradationremoval, and their combinations.